Metal Nano-Patterning

Patterning is accomplished by solid-state electrochemical nano deposition of metal clusters on the surface of a solid ionic conductor using an atomic force microscopy probe. Due to the swiftness of this process in generating patterns and the size of the resulting features, this process can be suitable for erasable high-density data storage applications.

Figure 1 shows a simplified schematic diagram of the experimental setup for nanopatterning of Ag on RbAg4I5, showing the time evolution of Ag atoms and ions under the voltage bias. The migration of silver ions in the ion conductor under the electric field is shown in steps between (b) and (e). Drawing not to scale.

Figure 2 shows AFM contact-mode deflection images of electrochemically induced Ag nano-features on RbAg4I5. Patterns are made from sequences of dots generated by applying bias voltage pulses of 200–400 mV for 0.25–5 ms.

Figure 1: Simplified schematics for metal nanopatterning Simplified schematics
Figure 2: Examplary patterns Examplary patterns


References

2 document(s) found.
[1]

81. M. Lee, R. O'Hayre, F. B. Prinz, and T. M. Gür, "Electrochemical Nanopatterning of Ag on Solid-State Ionic Conductor RbAg4I5 Using Atomic Force Microscopy", Appl. Phys. Lett. 85(#16), 3552 (2004) .
Minhwan Lee, Ryan O'Hayre, Turgut M. Gür, and Fritz B. Prinz, "Electrochemical nanopatterning of Ag on solid-state ionic conductor RbAg4I5 using atomic force microscopy, Applied Physics Letters, vol. 85, no. 16, 2004".
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[1]