Pulsed Laser Deposition
Pulsed laser deposition (PLD) is commonly used in semiconductor manufacturing to produce thin films. PLD is a physical vapor deposition technique where a target material is ablated by a laser, creating a plume of vaporized particles. Some of these particles land on the substrate.
Film quality is influenced by the distance from target to substrate, the pressure in the chamber, the heater temperature, and the laser power and frequency. Film thickness scales with the number of laser pulses.
Figure 1: PLD Model
